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Disambiguation of "Liebmann, Lars"

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Rules vs tools: what's the right way to address IC manufacturing complexity?

, , , and . ISPD, page 75-76. ACM, (2007)

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To differ between persons with the same name, the academic degree and the title of an important publication will be displayed. You can also use the button next to the name to display some publications already assigned to the person.

Lars Gadermann University of Stuttgart

CodeCharts and AI as Alternatives to On-site Eyetracking for Vehicle Design Evaluation, , and . HCI in Mobility, Transport and Automotive Systems, 15817, Springer, (May 2025)

Lars Klingel University of Stuttgart

Marvin Tigre Larschow University of Stuttgart

Lars Bippus University of Stuttgart

Dr. Lars Mautsch University of Stuttgart

 

Other publications of authors with the same name

Layout Decomposition and Legalization for Double-Patterning Technology., , , , , and . IEEE Trans. on CAD of Integrated Circuits and Systems, 32 (2): 202-215 (2013)A Designer's Guide to Subresolution Lithography: Enabling the Impossible to Get to the 14-nm Node [Tutorial]., and . IEEE Design & Test, 30 (3): 70-92 (2013)Application of automated design migration to alternating phase shift mask design., , and . ISPD, page 38-43. ACM, (2001)CAD computation for manufacturability: can we save VLSI technology from itself?, and . ICCAD, page 424-431. ACM / IEEE Computer Society, (2002)Pushing multiple patterning in sub-10nm: are we ready?, , , , and . DAC, page 197:1-197:6. ACM, (2015)TCAD development for lithography resolution enhancement., , , , , and . IBM Journal of Research and Development, 45 (5): 651-666 (2001)Coupling timing objectives with optical proximity correction for improved timing yield., , , , , and . ISQED, page 97-102. IEEE, (2011)Rules vs tools: what's the right way to address IC manufacturing complexity?, , , and . ISPD, page 75-76. ACM, (2007)Co-Optimization of Circuits, Layout and Lithography for Predictive Technology Scaling Beyond Gratings., , , , , and . IEEE Trans. on CAD of Integrated Circuits and Systems, 29 (4): 509-527 (2010)A framework for double patterning-enabled design., , , , , and . ICCAD, page 14-20. IEEE Computer Society, (2011)