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O(n) layout-coloring for multiple-patterning lithography and conflict-removal using compaction., , , , , and . ICICDT, page 1-4. IEEE, (2012)Design driven patterning optimizations for low K1 lithography., and . ICICDT, page 1-4. IEEE, (2012)Layout Decomposition and Legalization for Double-Patterning Technology., , , , , and . IEEE Trans. on CAD of Integrated Circuits and Systems, 32 (2): 202-215 (2013)Design-aware lithography., , and . ISPD, page 3-8. ACM, (2012)Electrically-driven retargeting for nanoscale layouts., , and . CICC, page 1-4. IEEE, (2011)A methodology for propagating design tolerances to shape tolerances for use in manufacturing., , , , and . DATE, page 1273-1278. IEEE, (2010)SMATO: Simultaneous mask and target optimization for improving lithographic process window., , and . ICCAD, page 100-106. IEEE, (2010)A framework for double patterning-enabled design., , , , , and . ICCAD, page 14-20. IEEE Computer Society, (2011)Ground rule slack aware tolerance-driven optical proximity correction for local metal interconnects., , and . CICC, page 1-4. IEEE, (2010)Coupling timing objectives with optical proximity correction for improved timing yield., , , , , and . ISQED, page 97-102. IEEE, (2011)