Author of the publication

A Designer's Guide to Subresolution Lithography: Enabling the Impossible to Get to the 14-nm Node [Tutorial].

, and . IEEE Design & Test, 30 (3): 70-92 (2013)

Please choose a person to relate this publication to

To differ between persons with the same name, the academic degree and the title of an important publication will be displayed. You can also use the button next to the name to display some publications already assigned to the person.

 

Other publications of authors with the same name

A Designer's Guide to Subresolution Lithography: Enabling the Impossible to Get to the 14-nm Node [Tutorial]., and . IEEE Design & Test, 30 (3): 70-92 (2013)Advanced multi-patterning and hybrid lithography techniques., and . ASP-DAC, page 611-616. IEEE, (2016)DSA-aware multiple patterning for the manufacturing of vias: Connections to graph coloring problems, IP formulations, and numerical experiments., , , and . CoRR, (2019)Litho-Friendly Decomposition Method for Self-Aligned Double Patterning., , and . IEEE Trans. VLSI Syst., 21 (8): 1469-1480 (2013)Combining lithography and Directed Self Assembly for the manufacturing of vias: Connections to graph coloring problems, integer programming formulations, and numerical experiments., , , and . European Journal of Operational Research, 280 (2): 453-468 (2020)High performance lithographic hotspot detection using hierarchically refined machine learning., , , and . ASP-DAC, page 775-780. IEEE, (2011)Rapid layout pattern classification., , , and . ASP-DAC, page 781-786. IEEE, (2011)Self-aligned double patterning (SADP) layout decomposition., , and . ISQED, page 103-109. IEEE, (2011)Litho-Friendly Decomposition Method for Self-Aligned Triple Patterning., , and . IEEE Trans. VLSI Syst., 22 (5): 1170-1174 (2014)High Performance Lithography Hotspot Detection With Successively Refined Pattern Identifications and Machine Learning., , and . IEEE Trans. on CAD of Integrated Circuits and Systems, 30 (11): 1621-1634 (2011)