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Modeling the Effect of Random Dopants on Hot-Carrier Degradation in FinFETs., , , , , , , , , and 1 other author(s). IRPS, page 1-7. IEEE, (2019)Stochastic Modeling of Hot-Carrier Degradation in nFinFETs Considering the Impact of Random Traps and Random Dopants., , , , , , , , , and 1 other author(s). ESSDERC, page 262-265. IEEE, (2019)Full (Vg, Vd) Bias Space Modeling of Hot-Carrier Degradation in Nanowire FETs., , , , , , , , , and . IRPS, page 1-7. IEEE, (2019)Origins and implications of increased channel hot carrier variability in nFinFETs., , , , , , , , , and 11 other author(s). IRPS, page 3. IEEE, (2015)A drift-diffusion-based analytic description of the energy distribution function for hot-carrier degradation in decananometer nMOSFETs., , , , , , , and . ESSDERC, page 428-431. IEEE, (2016)Comparison of analytic distribution function models for hot-carrier degradation modeling in nLDMOSFETs., , , , , , , , and . Microelectronics Reliability, 55 (9-10): 1427-1432 (2015)An analytical approach for physical modeling of hot-carrier induced degradation., , , , , , , , and . Microelectronics Reliability, 51 (9-11): 1525-1529 (2011)Impact of O-Si-O bond angle fluctuations on the Si-O bond-breakage rate., , , , and . Microelectronics Reliability, 49 (9-11): 998-1002 (2009)Interface traps density-of-states as a vital component for hot-carrier degradation modeling., , , , , , , , , and 4 other author(s). Microelectronics Reliability, 50 (9-11): 1267-1272 (2010)