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RF-Devices Realised in MEMS by Using Electrodepositable Photoresist

, , , and . Book of abstracts : SAFE2001 Semiconductor Advances for Future Electronics, ProRISC2001 Program for Research on Integrated Systems and Circuits, SeSens2001 Semiconductor Sensor and Actuator Technology, Utrecht, STW, Technology Foundation, (2001)

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Spray Coating of Photoresist for Pattern Transfer on High Topography Surfaces, , and . Journal of Micromechanics and Microengineering, 15 (4): 691-697 (2005)Metal Patterning on High Topography Surface For 3-D RF Devices Fabrication, , , , , and . Eurosensors XVII : September 21 - 24, 2003, Guimarães, Portugal : book of abstracts : the 17th European Conference on Solid State Transducers, (2003)Direct Spray Coating of Photoresist for MEMS Applications, , , , , and . Proc. SPIE 4557 : Micromachining and Microfabrication Process Technology VII, 4557, page 312-319. Bellingham, Washington, SPIE, (2001)RF-Devices Realised in MEMS by Using Electrodepositable Photoresist, , , and . Book of abstracts : SAFE2001 Semiconductor Advances for Future Electronics, ProRISC2001 Program for Research on Integrated Systems and Circuits, SeSens2001 Semiconductor Sensor and Actuator Technology, Utrecht, STW, Technology Foundation, (2001)Direct Spray Coating Of Photoresist : A New Method For Patterning 3-D Structures, , , , , and . Book of abstracts : Eurosensors XVI, The 16th European Conference on Solid-State Transducers, September 15 - 18, 2002, Prague, Czech Republic, page 89-90. Prag, Czech Technical University, (2002)IC-Compatible Two-Level Bulk Micromachining for RF Silicon Technology, , , and . 30th European Solid-State Device Research Conference, page 204-207. Bonchamp-Lès-Laval, Frontier Group, (2000)Through-Wafer Copper Electroplating for RF Silicon Technology, , , , , , and . 32nd European Solid-State Device Research Conference, page 255-258. Piscataway, New Jersey, IEEE, (2002)Metal patterning on high topography surface for 3D RF devices fabrication, , , , , and . Sensors and Actuators A : Physical, 115 (2-3): 557-562 (September 2004)Spin, Spray and Eloctroplating of Photoresist for MEMS Structures : A Comparison, , , and . 2002 proceedings : SAFE-ProRISC-SeSens, November 27 - 29, 2002, Veldhoven, the Netherlands, page 81-86. (2002)Spray Coating of AZ4562 Photoresist for MEMS Applications, , and . Book of abstracts : SAFE2001 Semiconductor Advances for Future Electronics, ProRISC2001 Program for Research on Integrated Systems and Circuits, SeSens2001 Semiconductor Sensor and Actuator Technology, page 154-158. Utrecht, STW, Technology Foundation, (2001)