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Design-aware lithography., , and . ISPD, page 3-8. ACM, (2012)Electrically driven optical proximity correction based on linear programming., , , and . ICCAD, page 473-479. IEEE Computer Society, (2008)Ground rule slack aware tolerance-driven optical proximity correction for local metal interconnects., , and . CICC, page 1-4. IEEE, (2010)Coupling timing objectives with optical proximity correction for improved timing yield., , , , , and . ISQED, page 97-102. IEEE, (2011)Wire delay variability in nanoscale technology and its impact on physical design., , and . ISQED, page 591-596. IEEE, (2013)ICCAD-2013 CAD contest in mask optimization and benchmark suite., , and . ICCAD, page 271-274. IEEE, (2013)Design driven patterning optimizations for low K1 lithography., and . ICICDT, page 1-4. IEEE, (2012)Electrically-driven retargeting for nanoscale layouts., , and . CICC, page 1-4. IEEE, (2011)Fast lithographic mask optimization considering process variation., , , , and . ICCAD, page 230-237. IEEE, (2014)A methodology for propagating design tolerances to shape tolerances for use in manufacturing., , , , and . DATE, page 1273-1278. IEEE, (2010)