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CMOS scaling into the 21st century: 0.1 µm and beyond., , , , , , , , and . IBM Journal of Research and Development, 39 (1-2): 245-260 (1995)Overview of gate linewidth control in the manufacture of CMOS logic chips., , , , , , , , , and 1 other author(s). IBM Journal of Research and Development, 39 (1-2): 189-200 (1995)Maintaining the benefits of CMOS scaling when scaling bogs down.. IBM Journal of Research and Development, 46 (2-3): 169-186 (2002)Silicon CMOS devices beyond scaling., , , , , , , , , and . IBM Journal of Research and Development, 50 (4-5): 339-362 (2006)Reduced-voltage power/performance optimization of the 3.6-volt PowerPC 601 Microprocessor., , , , and . IBM Journal of Research and Development, 39 (1-2): 33-42 (1995)High-performance CMOS variability in the 65-nm regime and beyond., , , , , , , , and . IBM Journal of Research and Development, 50 (4-5): 433-450 (2006)Compact modeling and simulation of PD-SOI MOSFETs: Current status and challenges., , , , , and . CICC, page 265-272. IEEE, (2008)High Performance Double-Gate Device Technology Challenges and Opportunities (invited)., , , , and . ISQED, page 492-495. IEEE Computer Society, (2002)RF potential of a 0.18-/spl mu/m CMOS logic device technology, , , , , , , and . IEEE Transactions on Electron Devices, 47 (4): 864-870 (April 2000)A Retrospective View on the Technology Evolution to Support Low Power Mobile Application., , , , , , and . J. Low Power Electronics, 14 (3): 374-392 (2018)