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Laser assisted formation of binary and ternary Ge/Si/Sn alloys, , , , , , , and . Thin Solid Films, 520 (8): 3262-3265 (2012)Silicon germanium tin alloys formed by pulsed laser induced epitaxy, , , , , , , , , and 1 other author(s). Applied Physics Letters, 100 (20): 204102 (2012)(Invited) UV Excimer Laser Assisted Heteroepitaxy of (Si)GeSn on Si(100), , , , , , and . ECS Transactions, 64 (6): 115--125 (August 2014)(Si)GeSn nanostructures for optoelectronic device applications, , , , and . 2016 39th International Convention on Information and Communication Technology, Electronics and Microelectronics (MIPRO), page 1-4. Piscataway, NJ, IEEE, (2016)Multi-stacks of epitaxial GeSn self-assembled dots in Si: Structural analysis, , , , , , , and . Journal of applied physics, 117 (12): 125706 (2015)Fabrication of GePb-Alloys by Means of Pulsed Laser Induced Epitaxy, , , , , , and . 2019 42nd International Convention on Information and Communication Technology, Electronics and Microelectronics (MIPRO), page 1-6. IEEE, (2019)Fabrication of GeSn-multiple quantum wells by overgrowth of Sn on Ge by using molecular beam epitaxy, , , , , , , , and . Applied physics letters, 107 (26): 262102 (2015)Photoluminescence from ultrathin Ge-rich multiple quantum wells observed up to room temperature: Experiments and modeling, , , , , , , , , and 2 other author(s). Physical review. B, Condensed matter and materials physics, 94 (24): 245304 (2016)Growth of patterned GeSn and GePb alloys by pulsed laser induced epitaxy, , , , , and . 2017 40th International Convention on Information and Communication Technology, Electronics and Microelectronics (MIPRO), page 37-42. IEEE, (2017)