%0 Conference Paper %1 conf/iccad/BanerjeeAO10 %A Banerjee, Shayak %A Agarwal, Kanak B. %A Orshansky, Michael %B ICCAD %D 2010 %E Scheffer, Louis %E Phillips, Joel R. %E Hu, Alan J. %I IEEE %K dblp %P 100-106 %T SMATO: Simultaneous mask and target optimization for improving lithographic process window. %U http://dblp.uni-trier.de/db/conf/iccad/iccad2010.html#BanerjeeAO10 %@ 978-1-4244-8192-7

@inproceedings{conf/iccad/BanerjeeAO10, added-at = {2019-02-11T00:00:00.000+0100}, author = {Banerjee, Shayak and Agarwal, Kanak B. and Orshansky, Michael}, biburl = {https://puma.ub.uni-stuttgart.de/bibtex/252059eca329a123a5709964202d6bc02/dblp}, booktitle = {ICCAD}, crossref = {conf/iccad/2010}, editor = {Scheffer, Louis and Phillips, Joel R. and Hu, Alan J.}, ee = {http://dl.acm.org/citation.cfm?id=2133449}, interhash = {c5604fcda08ac8c075a710b495279af5}, intrahash = {52059eca329a123a5709964202d6bc02}, isbn = {978-1-4244-8192-7}, keywords = {dblp}, pages = {100-106}, publisher = {IEEE}, timestamp = {2019-09-27T20:30:46.000+0200}, title = {SMATO: Simultaneous mask and target optimization for improving lithographic process window.}, url = {http://dblp.uni-trier.de/db/conf/iccad/iccad2010.html#BanerjeeAO10}, year = 2010 }