Theoretical simulations predict that direct band transitions are favored in Germanium-Lead (GePb) alloys with Pb concentrations of cPb Ĭ 3.4%. This could enable the creation of semiconductor lasers that are directly structured on Ge substrates. However, the formation of alloys with these properties is hindered by the low equilibrium solubility of Pb in Ge. Therefore, the usage of out-ofequilibrium growth methods, such as pulsed laser induced epitaxy (PLIE), is necessary. The contribution focusses on the formation of GePb alloys with varying Pb concentrations.
%0 Conference Paper
%1 8756640
%A Weiser, Mathias C. J.
%A Schwarz, D.
%A Funk, H. S.
%A Weißhaupt, David
%A Serra, C.
%A Schulze, Jörg
%A Chiussi, S.
%B 2019 42nd International Convention on Information and Communication Technology, Electronics and Microelectronics (MIPRO)
%D 2019
%K iht j.schulze.iht journal professional_meetings
%P 1-6
%R 10.23919/MIPRO.2019.8756640
%T Fabrication of GePb-Alloys by Means of Pulsed Laser Induced Epitaxy
%U https://ieeexplore.ieee.org/document/8756640/
%X Theoretical simulations predict that direct band transitions are favored in Germanium-Lead (GePb) alloys with Pb concentrations of cPb Ĭ 3.4%. This could enable the creation of semiconductor lasers that are directly structured on Ge substrates. However, the formation of alloys with these properties is hindered by the low equilibrium solubility of Pb in Ge. Therefore, the usage of out-ofequilibrium growth methods, such as pulsed laser induced epitaxy (PLIE), is necessary. The contribution focusses on the formation of GePb alloys with varying Pb concentrations.
@inproceedings{8756640,
abstract = {Theoretical simulations predict that direct band transitions are favored in Germanium-Lead (GePb) alloys with Pb concentrations of cPb Ĭ 3.4%. This could enable the creation of semiconductor lasers that are directly structured on Ge substrates. However, the formation of alloys with these properties is hindered by the low equilibrium solubility of Pb in Ge. Therefore, the usage of out-ofequilibrium growth methods, such as pulsed laser induced epitaxy (PLIE), is necessary. The contribution focusses on the formation of GePb alloys with varying Pb concentrations.},
added-at = {2019-10-22T13:31:46.000+0200},
author = {Weiser, Mathias C. J. and Schwarz, D. and Funk, H. S. and Weißhaupt, David and Serra, C. and Schulze, Jörg and Chiussi, S.},
biburl = {https://puma.ub.uni-stuttgart.de/bibtex/2d52418803a4fd5fedc81d6cca0c7055c/ihtpublikation},
booktitle = {2019 42nd International Convention on Information and Communication Technology, Electronics and Microelectronics (MIPRO)},
doi = {10.23919/MIPRO.2019.8756640},
interhash = {ac5233912ee07951f17a1d21f99f706d},
intrahash = {d52418803a4fd5fedc81d6cca0c7055c},
keywords = {iht j.schulze.iht journal professional_meetings},
month = may,
pages = {1-6},
timestamp = {2019-10-22T12:18:28.000+0200},
title = {Fabrication of GePb-Alloys by Means of Pulsed Laser Induced Epitaxy},
url = {https://ieeexplore.ieee.org/document/8756640/},
year = 2019
}