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Electrical Characterization of SiGeSn/Ge/GeSn-pin-Heterodiodes at Low Temperatures

, , , , , , , and . 2021 44th International Convention on Information, Communication and Electronic Technology (MIPRO), page 55-59. (September 2021)
DOI: 10.23919/MIPRO52101.2021.9597082

Abstract

The combination of the ternary alloy Si<inf>x</inf>Ge<inf>l-x-y</inf>Sn<inf>y</inf> with Gel<inf>-y</inf>Sn<inf>y</inf> is very promising for electrooptical applications in the near infrared regime up to 2.5 µm wavelength. With the tunable bandgap at a non-varying lattice constant SixGe<inf>l-x-y</inf> Sny is predestined for the lattice matched growth on a Ge virtual substrate and the integration of pseudomorphic Gel-ySny layers with high Sn content (&gt; 10 %). The main challenge of the growth of such alloys is to achieve a low density of defects. However, in the last few years there was a major progress in growing highly doped SixGe<inf>l-x-y</inf>Sny layers with good crystal quality. In this work we investigate the electrical characteristics of a SixGe<inf>l-x-y</inf>Sny/Ge/Ge<inf>l-y</inf>Sny -pin-heterodiode in a temperature range from 300 K to 8 K. This temperature depended measurement provides the opportunity for a more precise characterization of such diodes. A linear relation between reciprocal temperature and the ideality factor is found. With the extrapolation of this relation up to room temperature the ideality factor of the diode is calculated (n = 1.22). From the temperature dependent reverse current the activation energy is determined (<tex>$E_A= 0.178$</tex> eV). We discuss the possibility to utilize such diodes for near infrared electrooptical applications.

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Electrical Characterization of SiGeSn/Ge/GeSn-pin-Heterodiodes at Low Temperatures | IEEE Conference Publication | IEEE Xplore

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