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%0 Journal Article
%1 journals/chinaf/WeiELD14
%A Wei, Kangliang
%A Egley, James
%A Liu, Xiaoyan
%A Du, Gang
%D 2014
%J SCIENCE CHINA Information Sciences
%K dblp
%N 2
%P 1-9
%T Remote charge scattering: a full Coulomb interaction approach and its impact on silicon nMOS FinFETs with HfO2 gate dielectric.
%U http://dblp.uni-trier.de/db/journals/chinaf/chinaf57.html#WeiELD14
%V 57
@article{journals/chinaf/WeiELD14,
added-at = {2014-03-06T00:00:00.000+0100},
author = {Wei, Kangliang and Egley, James and Liu, Xiaoyan and Du, Gang},
biburl = {https://puma.ub.uni-stuttgart.de/bibtex/25df86182ef8f54f211e00a0ce034d880/dblp},
ee = {http://dx.doi.org/10.1007/s11432-013-4810-0},
interhash = {f57a5dd69735690dd717dc668879a246},
intrahash = {5df86182ef8f54f211e00a0ce034d880},
journal = {SCIENCE CHINA Information Sciences},
keywords = {dblp},
number = 2,
pages = {1-9},
timestamp = {2016-02-02T06:12:51.000+0100},
title = {Remote charge scattering: a full Coulomb interaction approach and its impact on silicon nMOS FinFETs with HfO2 gate dielectric.},
url = {http://dblp.uni-trier.de/db/journals/chinaf/chinaf57.html#WeiELD14},
volume = 57,
year = 2014
}
