%0 Journal Article %1 journals/mr/FaccioBCFGMS08 %A Faccio, Federico %A Barnaby, Hugh J. %A Chen, Xiao J. %A Fleetwood, Daniel M. %A Gonella, Laura %A McLain, Michael L. %A Schrimpf, Ronald D. %D 2008 %J Microelectronics Reliability %K dblp %N 7 %P 1000-1007 %T Total ionizing dose effects in shallow trench isolation oxides. %U http://dblp.uni-trier.de/db/journals/mr/mr48.html#FaccioBCFGMS08 %V 48

@article{journals/mr/FaccioBCFGMS08, added-at = {2012-05-08T00:00:00.000+0200}, author = {Faccio, Federico and Barnaby, Hugh J. and Chen, Xiao J. and Fleetwood, Daniel M. and Gonella, Laura and McLain, Michael L. and Schrimpf, Ronald D.}, biburl = {https://puma.ub.uni-stuttgart.de/bibtex/2c1b537b5616951875149802d556e761c/dblp}, ee = {http://dx.doi.org/10.1016/j.microrel.2008.04.004}, interhash = {ccba383997308f8ba95e77a85bbf8f1c}, intrahash = {c1b537b5616951875149802d556e761c}, journal = {Microelectronics Reliability}, keywords = {dblp}, number = 7, pages = {1000-1007}, timestamp = {2016-02-02T02:01:59.000+0100}, title = {Total ionizing dose effects in shallow trench isolation oxides.}, url = {http://dblp.uni-trier.de/db/journals/mr/mr48.html#FaccioBCFGMS08}, volume = 48, year = 2008 }