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Disambiguation of "Du, Yuelin"

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Constrained pattern assignment for standard cell based triple patterning lithography.

, , , , and . ICCAD, page 178-185. IEEE, (2013)

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Qian Du University of Stuttgart

Christian Dürnhofer University of Stuttgart

Andrian Dudonu University of Stuttgart

Tobias Dürr University of Stuttgart

Margun Dürr University of Stuttgart

 

Other publications of authors with the same name

A polynomial time exact algorithm for self-aligned double patterning layout decomposition., , , and . ISPD, page 17-24. ACM, (2012)Directed Self-Assembly (DSA) Template Pattern Verification., , , , , , and . DAC, page 55:1-55:6. ACM, (2014)Optimally minimizing overlay violation in self-aligned double patterning decomposition for row-based standard cell layout in polynomial time., , , and . ICCAD, page 32-39. IEEE, (2013)Polynomial time optimal algorithm for stencil row planning in e-beam lithography., , and . ASP-DAC, page 658-664. IEEE, (2015)Contact pitch and location prediction for Directed Self-Assembly template verification., , , , , and . ASP-DAC, page 644-651. IEEE, (2015)A Novel Method of Human Tracking Based on Stereo Vision., and . CCIS, page 883-889. IEEE, (2018)Spacer-is-dielectric-compliant detailed routing for self-aligned double patterning lithography., , , , , , and . DAC, page 93:1-93:6. ACM, (2013)Mask cost reduction with circuit performance consideration for self-aligned double patterning., , , and . ASP-DAC, page 787-792. IEEE, (2011)Layout small-angle rotation and shift for EUV defect mitigation., , , , and . ICCAD, page 43-49. ACM, (2012)Self-aligned double patterning decomposition for overlay minimization and hot spot detection., , , and . DAC, page 71-76. ACM, (2011)