White-light Mueller-matrix Fourier scatterometry for the characterization of nanostructures with large parameter spaces
M. Gödecke, K. Frenner, and W. Osten. Metrology, Inspection, and Process Control for Microlithography XXXIV, 11325, page 113250V. International Society for Optics and Photonics, SPIE, (2020)
DOI: 10.1117/12.2551276
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