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Thin-film imaging: Past, present, prognosis.

, , , , and . IBM Journal of Research and Development, 41 (1&2): 105-118 (1997)

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Thin-film imaging: Past, present, prognosis., , , , and . IBM Journal of Research and Development, 41 (1&2): 105-118 (1997)Photoresists for 193-nm lithography., , , and . IBM Journal of Research and Development, 41 (1&2): 95-104 (1997)Review of technology for 157-nm lithography., , , , , , and . IBM Journal of Research and Development, 45 (5): 605-614 (2001)Lithography at a wavelength of 193 nm., , , , and . IBM Journal of Research and Development, 41 (1&2): 49-56 (1997)