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Negative photoresists for optical lithography., , , , and . IBM Journal of Research and Development, 41 (1&2): 81-94 (1997)A half-micron CMOS logic generation., , , , , , , , , and 14 other author(s). IBM Journal of Research and Development, 39 (1-2): 215-228 (1995)Overview of gate linewidth control in the manufacture of CMOS logic chips., , , , , , , , , and 1 other author(s). IBM Journal of Research and Development, 39 (1-2): 189-200 (1995)Manufacturing with DUV lithography., , and . IBM Journal of Research and Development, 41 (1&2): 7-20 (1997)The evolution of IBM CMOS DRAM technology., , , , , , , , , and 5 other author(s). IBM Journal of Research and Development, 39 (1-2): 167-188 (1995)