Article,

Germanium-tin p-i-n photodetectors integrated on silicon grown by molecular beam epitaxy

, , , , , , and .
Applied Physics Letters, 98 (6): 061108 (2011)
DOI: 10.1063/1.3555439

Abstract

GeSn heterojunction p-i-n diodes with a Sn content of 0.5% are grown with a special low temperature molecular beam epitaxy. The Sn incorporation in Ge is facilitated by a very low temperature growth step in order to suppress Sn surface segregation. Diodes with sharp doping transitions are realized as double mesa structures with a diameter from 1.5 up to 80 μm. An optical responsivity of these GeSn diodes of 0.1 A/W at a wavelength of λ=1.55 μm is measured. In comparison with a pure Ge detector the optical responsivity is increased by factor of 3 as a result of Sn caused band gap reduction.

Tags

Users

  • @unibiblio
  • @ihtpublikation

Comments and Reviews