The optimization of the lithographic process in semiconductor industry is continuously conducting towards smaller devices and structures but at the same time highly increasing metrology exigencies.
%0 Conference Paper
%1 10.1007/978-3-642-36359-7_62
%A Ferreras Paz, Valeriano
%A Frenner, Karsten
%A Osten, Wolfgang
%B Fringe 2013
%C Berlin, Heidelberg
%D 2014
%E Osten, Wolfgang
%I Springer Berlin Heidelberg
%K ito karsten_frenner
%P 345--348
%T Increasing Scatterometric Sensitivity by Simulation Based Optimization of Structure Design
%X The optimization of the lithographic process in semiconductor industry is continuously conducting towards smaller devices and structures but at the same time highly increasing metrology exigencies.
%@ 978-3-642-36359-7
@inproceedings{10.1007/978-3-642-36359-7_62,
abstract = {The optimization of the lithographic process in semiconductor industry is continuously conducting towards smaller devices and structures but at the same time highly increasing metrology exigencies.},
added-at = {2023-06-23T06:33:23.000+0200},
address = {Berlin, Heidelberg},
author = {Ferreras Paz, Valeriano and Frenner, Karsten and Osten, Wolfgang},
biburl = {https://puma.ub.uni-stuttgart.de/bibtex/291db2a6ec081ae6f3bc604cb8dfb2088/ffischer},
booktitle = {Fringe 2013},
editor = {Osten, Wolfgang},
interhash = {beacdc522df557fdc204510b838ce571},
intrahash = {91db2a6ec081ae6f3bc604cb8dfb2088},
isbn = {978-3-642-36359-7},
keywords = {ito karsten_frenner},
pages = {345--348},
publisher = {Springer Berlin Heidelberg},
timestamp = {2023-06-23T06:33:23.000+0200},
title = {Increasing Scatterometric Sensitivity by Simulation Based Optimization of Structure Design},
year = 2014
}