%0 Conference Paper %1 10.1007/978-3-642-36359-7_62 %A Ferreras Paz, Valeriano %A Frenner, Karsten %A Osten, Wolfgang %B Fringe 2013 %C Berlin, Heidelberg %D 2014 %E Osten, Wolfgang %I Springer Berlin Heidelberg %K ito karsten_frenner %P 345--348 %T Increasing Scatterometric Sensitivity by Simulation Based Optimization of Structure Design %X The optimization of the lithographic process in semiconductor industry is continuously conducting towards smaller devices and structures but at the same time highly increasing metrology exigencies. %@ 978-3-642-36359-7

@inproceedings{10.1007/978-3-642-36359-7_62, abstract = {The optimization of the lithographic process in semiconductor industry is continuously conducting towards smaller devices and structures but at the same time highly increasing metrology exigencies.}, added-at = {2023-06-23T06:33:23.000+0200}, address = {Berlin, Heidelberg}, author = {Ferreras Paz, Valeriano and Frenner, Karsten and Osten, Wolfgang}, biburl = {https://puma.ub.uni-stuttgart.de/bibtex/291db2a6ec081ae6f3bc604cb8dfb2088/ffischer}, booktitle = {Fringe 2013}, editor = {Osten, Wolfgang}, interhash = {beacdc522df557fdc204510b838ce571}, intrahash = {91db2a6ec081ae6f3bc604cb8dfb2088}, isbn = {978-3-642-36359-7}, keywords = {ito karsten_frenner}, pages = {345--348}, publisher = {Springer Berlin Heidelberg}, timestamp = {2023-06-23T06:33:23.000+0200}, title = {Increasing Scatterometric Sensitivity by Simulation Based Optimization of Structure Design}, year = 2014 }