%0 Journal Article %1 journals/mr/PecoraMBCMMFY05 %A Pecora, A. %A Maiolo, Luca %A Bonfiglietti, A. %A Cuscunà, M. %A Mecarini, F. %A Mariucci, Luigi %A Fortunato, Guglielmo %A Young, N. D. %D 2005 %J Microelectronics Reliability %K dblp %N 5-6 %P 879-882 %T Silicon dioxide deposited by ECR-PECVD for low-temperature Si devices processing. %U http://dblp.uni-trier.de/db/journals/mr/mr45.html#PecoraMBCMMFY05 %V 45

@article{journals/mr/PecoraMBCMMFY05, added-at = {2019-06-02T00:00:00.000+0200}, author = {Pecora, A. and Maiolo, Luca and Bonfiglietti, A. and Cuscunà, M. and Mecarini, F. and Mariucci, Luigi and Fortunato, Guglielmo and Young, N. D.}, biburl = {https://puma.ub.uni-stuttgart.de/bibtex/2cf3683130d5a1f6330f98bc94f11b005/dblp}, ee = {https://www.wikidata.org/entity/Q60184834}, interhash = {ee65624f2a8b4d21bac0c9bc472f3341}, intrahash = {cf3683130d5a1f6330f98bc94f11b005}, journal = {Microelectronics Reliability}, keywords = {dblp}, number = {5-6}, pages = {879-882}, timestamp = {2019-09-27T10:58:20.000+0200}, title = {Silicon dioxide deposited by ECR-PECVD for low-temperature Si devices processing.}, url = {http://dblp.uni-trier.de/db/journals/mr/mr45.html#PecoraMBCMMFY05}, volume = 45, year = 2005 }