%0 Journal Article %1 journals/tcad/SuHTCB16 %A Su, Yu-Hsuan %A Huang, Yu-Chen %A Tsai, Liang-Chun %A Chang, Yao-Wen %A Banerjee, Shayak %D 2016 %J IEEE Trans. on CAD of Integrated Circuits and Systems %K dblp %N 8 %P 1345-1357 %T Fast Lithographic Mask Optimization Considering Process Variation. %U http://dblp.uni-trier.de/db/journals/tcad/tcad35.html#SuHTCB16 %V 35

@article{journals/tcad/SuHTCB16, added-at = {2016-07-25T00:00:00.000+0200}, author = {Su, Yu-Hsuan and Huang, Yu-Chen and Tsai, Liang-Chun and Chang, Yao-Wen and Banerjee, Shayak}, biburl = {https://puma.ub.uni-stuttgart.de/bibtex/29faa7324ac3a786e8f37c55e79d91fcb/dblp}, ee = {http://dx.doi.org/10.1109/TCAD.2015.2514082}, interhash = {41406492740c6b3e01fdd627e01e3857}, intrahash = {9faa7324ac3a786e8f37c55e79d91fcb}, journal = {IEEE Trans. on CAD of Integrated Circuits and Systems}, keywords = {dblp}, number = 8, pages = {1345-1357}, timestamp = {2016-07-26T09:32:14.000+0200}, title = {Fast Lithographic Mask Optimization Considering Process Variation.}, url = {http://dblp.uni-trier.de/db/journals/tcad/tcad35.html#SuHTCB16}, volume = 35, year = 2016 }