%0 Journal Article %1 voicu2007solventvaporassisted %A Voicu, N. E %A Ludwigs, S. %A Crossland, E. J. W %A Andrew, P. %A Steiner, U. %B Advanced Materials %D 2007 %I John Wiley & Sons, Ltd %J Advanced Materials %K ipoc-fp %N 5 %P 757 %R https://doi.org/10.1002/adma.200601599 %T Solvent-Vapor-Assisted Imprint Lithography %U https://doi.org/10.1002/adma.200601599 %V 19 %X Sub-micrometer features are replicated into high-molecular-weight polymer resists by using solvent-assisted nanoimprint lithography (see figure). By swelling the polymer in a controlled solvent-vapor atmosphere, millibar pressures and ambient temperatures are sufficient to achieve high-fidelity replication.

@article{voicu2007solventvaporassisted, abstract = {Sub-micrometer features are replicated into high-molecular-weight polymer resists by using solvent-assisted nanoimprint lithography (see figure). By swelling the polymer in a controlled solvent-vapor atmosphere, millibar pressures and ambient temperatures are sufficient to achieve high-fidelity replication.}, added-at = {2022-11-17T11:21:54.000+0100}, author = {Voicu, N. E and Ludwigs, S. and Crossland, E. J. W and Andrew, P. and Steiner, U.}, biburl = {https://puma.ub.uni-stuttgart.de/bibtex/2fa98f920e10e607a852a2c3188fc03c0/bomiecienski}, booktitle = {Advanced Materials}, comment = {https://doi.org/10.1002/adma.200601599}, doi = {https://doi.org/10.1002/adma.200601599}, interhash = {321d706d480419bebdf671b37cb75a51}, intrahash = {fa98f920e10e607a852a2c3188fc03c0}, issn = {09359648}, journal = {Advanced Materials}, keywords = {ipoc-fp}, month = {3}, number = 5, pages = 757, publisher = {John Wiley & Sons, Ltd}, timestamp = {2023-05-15T12:49:28.000+0200}, title = {Solvent-Vapor-Assisted Imprint Lithography}, url = {https://doi.org/10.1002/adma.200601599}, volume = 19, year = 2007 }