Wrapped writing mode is a simple, inexpensive approach to multiphoton stereolithography. Standard &\#x223C;10 &\#x00B5;m thin cling foil shields the objective from direct contact with the photoresist, without compromising writing resolution. A diffraction limited lateral voxel width below 150 nm was demonstrated through ray tracing simulations and electron microscopy using standard polymer photoresist. Wrapped mode, like dip-in printing, is not limited by the objective working distance height. Its utility to prototype new print resists was validated through custom aqueous protein, silver nitrate, and black epoxy based formulations.
%0 Journal Article
%1 Toulouse:22
%A Toulouse, Andrea
%A Thiele, Simon
%A Hirzel, Kai
%A Schmid, Michael
%A Weber, Ksenia
%A Zyrianova, Maria
%A Giessen, Harald
%A Herkommer, Alois M.
%A Heymann, Michael
%D 2022
%I Optica Publishing Group
%J Opt. Mater. Express
%K alois_herkommer andrea_toulouse ito journal ods reviewed
%N 9
%P 3801--3809
%R 10.1364/OME.468534
%T High resolution femtosecond direct laser writing with wrapped lens
%U https://opg.optica.org/ome/abstract.cfm?URI=ome-12-9-3801
%V 12
%X Wrapped writing mode is a simple, inexpensive approach to multiphoton stereolithography. Standard &\#x223C;10 &\#x00B5;m thin cling foil shields the objective from direct contact with the photoresist, without compromising writing resolution. A diffraction limited lateral voxel width below 150 nm was demonstrated through ray tracing simulations and electron microscopy using standard polymer photoresist. Wrapped mode, like dip-in printing, is not limited by the objective working distance height. Its utility to prototype new print resists was validated through custom aqueous protein, silver nitrate, and black epoxy based formulations.
@article{Toulouse:22,
abstract = {Wrapped writing mode is a simple, inexpensive approach to multiphoton stereolithography. Standard \&\#x223C;10 \&\#x00B5;m thin cling foil shields the objective from direct contact with the photoresist, without compromising writing resolution. A diffraction limited lateral voxel width below 150 nm was demonstrated through ray tracing simulations and electron microscopy using standard polymer photoresist. Wrapped mode, like dip-in printing, is not limited by the objective working distance height. Its utility to prototype new print resists was validated through custom aqueous protein, silver nitrate, and black epoxy based formulations.},
added-at = {2023-06-23T07:41:13.000+0200},
author = {Toulouse, Andrea and Thiele, Simon and Hirzel, Kai and Schmid, Michael and Weber, Ksenia and Zyrianova, Maria and Giessen, Harald and Herkommer, Alois M. and Heymann, Michael},
biburl = {https://puma.ub.uni-stuttgart.de/bibtex/290bf9b9eec5c0abed7448ffa4acc840c/ffischer},
doi = {10.1364/OME.468534},
interhash = {fc1f6fa75697fbd1ed59adf4b41c4730},
intrahash = {90bf9b9eec5c0abed7448ffa4acc840c},
journal = {Opt. Mater. Express},
keywords = {alois_herkommer andrea_toulouse ito journal ods reviewed},
month = sep,
number = 9,
pages = {3801--3809},
publisher = {Optica Publishing Group},
timestamp = {2023-08-23T14:26:56.000+0200},
title = {High resolution femtosecond direct laser writing with wrapped lens},
url = {https://opg.optica.org/ome/abstract.cfm?URI=ome-12-9-3801},
volume = 12,
year = 2022
}
