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Electroluminescence of SiGeSn/GeSn pin-Diodes Grown on a GeSn Buffer

, , , , , , and . ESSCIRC 2022- IEEE 48th European Solid State Circuits Conference (ESSCIRC), page 165-168. (September 2022)
DOI: 10.1109/ESSCIRC55480.2022.9911458

Abstract

We present the growth, fabrication, and characterization of a GeSn pin-diode and a SiGeSn\GeSn pin-diode. The pin-diodes are grown by molecular beam epitaxy on a partially relaxed GeSn buffer grown by reduce-pressure chemical vapor deposition. The analysis of the crystal shows that the GeSn pin-diode is lattice-matched grown and the SiGeSn/GeSn pin-diode is pseudomorphic grown with respect to the buffer. Temperature-dependent direct current measurements reveal a threshold voltage shift from 0.3 V to 0.55 V and a series resistance that shows metallic behavior. Furthermore, by comparing the electroluminescence spectra at 13.4 K and 293 K we observe a 10 times higher signal for the GeSn pin-diode and a 3 times higher signal for the SiGeSn/GeSn pin-diode at cryogenic temperatures. The peak energies at an injection current density of 2.5 kA/cm2 are 575 meV and 610 meV, respectively.

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Electroluminescence of SiGeSn/GeSn pin-Diodes Grown on a GeSn Buffer | IEEE Conference Publication | IEEE Xplore

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