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Single- and multi-layer conductive patterns fabricated using maskless mesoscale material deposition

, , , , and . Proceedings of the 4th International Conference on Multi-Material Micro Manufacture, page 77-80. Whittles Publishing, (September 2008)

Abstract

The continual trend of miniaturization and increasing complexity in the field of microelectronic devices pose a challenge for today's manufacturing technology. The novel Maskless Mesoscale Material Deposition (M3D) manufacturing technology offers the potential for printing superfine circuitry as well as for the building up of multi-layer systems. Therefore it could be an interesting technology to meet the requirements of miniaturized systems. The M3D process depends on aerosol formation and uses aerodynamic focusing of aerosol streams for a high resolution deposition of cooloidal suspensions and liquid raw material. Since M3D is a contactless and maskless Direct Write Technolgy, it also offers new possibilities for 3D devices. This paper will report on first results of depositing conductive and non conductive materials onto glass substrates as well as onto typical MID (Moulded Interconnect Devices) substrates. Furthermore it will present first mult-layer systems that have been fabricated using the M3D technology.

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