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%0 Journal Article
%1 journals/mr/MutchPBCLLNBFKF16
%A Mutch, Michael J.
%A Pomorski, Thomas
%A Bittel, Brad C.
%A Cochrane, Corey J.
%A Lenahan, Patrick M.
%A Liu, Xin
%A Nemanich, Robert J.
%A Brockman, Justin
%A French, Marc
%A Kuhn, Markus
%A French, Benjamin
%A King, Sean W.
%D 2016
%J Microelectronics Reliability
%K dblp
%P 201-213
%T Band diagram for low-k/Cu interconnects: The starting point for understanding back-end-of-line (BEOL) electrical reliability.
%U http://dblp.uni-trier.de/db/journals/mr/mr63.html#MutchPBCLLNBFKF16
%V 63
@article{journals/mr/MutchPBCLLNBFKF16,
added-at = {2018-11-30T00:00:00.000+0100},
author = {Mutch, Michael J. and Pomorski, Thomas and Bittel, Brad C. and Cochrane, Corey J. and Lenahan, Patrick M. and Liu, Xin and Nemanich, Robert J. and Brockman, Justin and French, Marc and Kuhn, Markus and French, Benjamin and King, Sean W.},
biburl = {https://puma.ub.uni-stuttgart.de/bibtex/2eca299e92ecb823a1c529c40740d2118/dblp},
ee = {https://doi.org/10.1016/j.microrel.2016.04.004},
interhash = {f870dd45e08139edd85c1d443f410c58},
intrahash = {eca299e92ecb823a1c529c40740d2118},
journal = {Microelectronics Reliability},
keywords = {dblp},
pages = {201-213},
timestamp = {2019-09-27T10:58:08.000+0200},
title = {Band diagram for low-k/Cu interconnects: The starting point for understanding back-end-of-line (BEOL) electrical reliability.},
url = {http://dblp.uni-trier.de/db/journals/mr/mr63.html#MutchPBCLLNBFKF16},
volume = 63,
year = 2016
}
