%0 Journal Article %1 journals/tvlsi/AwadTTK17 %A Awad, Ahmed %A Takahashi, Atsushi %A Tanaka, Satoshi %A Kodama, Chikaaki %D 2017 %J IEEE Trans. VLSI Syst. %K dblp %N 3 %P 998-1011 %T A Fast Process-Variation-Aware Mask Optimization Algorithm With a Novel Intensity Modeling. %U http://dblp.uni-trier.de/db/journals/tvlsi/tvlsi25.html#AwadTTK17 %V 25

@article{journals/tvlsi/AwadTTK17, added-at = {2019-08-31T00:00:00.000+0200}, author = {Awad, Ahmed and Takahashi, Atsushi and Tanaka, Satoshi and Kodama, Chikaaki}, biburl = {https://puma.ub.uni-stuttgart.de/bibtex/2bee9e003dc1a21e24c25bc9be355761d/dblp}, ee = {https://doi.org/10.1109/TVLSI.2016.2616840}, interhash = {f7fa48a27e801dd473fc0ce1119cbd76}, intrahash = {bee9e003dc1a21e24c25bc9be355761d}, journal = {IEEE Trans. VLSI Syst.}, keywords = {dblp}, number = 3, pages = {998-1011}, timestamp = {2019-09-27T06:53:33.000+0200}, title = {A Fast Process-Variation-Aware Mask Optimization Algorithm With a Novel Intensity Modeling.}, url = {http://dblp.uni-trier.de/db/journals/tvlsi/tvlsi25.html#AwadTTK17}, volume = 25, year = 2017 }