%0 Journal Article %1 journals/mr/JelenkovicTCW03 %A Jelenkovic, Emil V. %A Tong, K. Y. %A Cheung, W. Y. %A Wong, S. P. %D 2003 %J Microelectronics Reliability %K dblp %N 1 %P 49-55 %T Degradation of RuO2 thin films in hydrogen atmosphere at temperatures between 150 and 250 degreeC. %U http://dblp.uni-trier.de/db/journals/mr/mr43.html#JelenkovicTCW03 %V 43

@article{journals/mr/JelenkovicTCW03, added-at = {2007-03-25T00:00:00.000+0100}, author = {Jelenkovic, Emil V. and Tong, K. Y. and Cheung, W. Y. and Wong, S. P.}, biburl = {https://puma.ub.uni-stuttgart.de/bibtex/223afe5b7bd92bebf66ff947f8427d417/dblp}, ee = {http://dx.doi.org/10.1016/S0026-2714(02)00274-3}, interhash = {d141ef99a46dff95ea57c7c270ab6618}, intrahash = {23afe5b7bd92bebf66ff947f8427d417}, journal = {Microelectronics Reliability}, keywords = {dblp}, number = 1, pages = {49-55}, timestamp = {2016-02-02T02:02:17.000+0100}, title = {Degradation of RuO2 thin films in hydrogen atmosphere at temperatures between 150 and 250 degreeC.}, url = {http://dblp.uni-trier.de/db/journals/mr/mr43.html#JelenkovicTCW03}, volume = 43, year = 2003 }