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%0 Journal Article
%1 journals/mr/AlvarezCRALGEHS09
%A Alvarez, David
%A Chatty, Kiran V.
%A Russ, Christian
%A Abou-Khalil, Michel J.
%A Li, Junjun
%A Gauthier, Robert
%A Esmark, Kai
%A Halbach, Ralph
%A Seguin, Christopher
%D 2009
%J Microelectronics Reliability
%K dblp
%N 12
%P 1417-1423
%T Design optimization of gate-silicided ESD NMOSFETs in a 45 nm bulk CMOS technology.
%U http://dblp.uni-trier.de/db/journals/mr/mr49.html#AlvarezCRALGEHS09
%V 49
@article{journals/mr/AlvarezCRALGEHS09,
added-at = {2010-09-28T00:00:00.000+0200},
author = {Alvarez, David and Chatty, Kiran V. and Russ, Christian and Abou-Khalil, Michel J. and Li, Junjun and Gauthier, Robert and Esmark, Kai and Halbach, Ralph and Seguin, Christopher},
biburl = {https://puma.ub.uni-stuttgart.de/bibtex/2e0966b86e9430c2233b926abe385b0ec/dblp},
ee = {http://dx.doi.org/10.1016/j.microrel.2009.06.051},
interhash = {99d50c34b0b49e13a35a98ea9415d262},
intrahash = {e0966b86e9430c2233b926abe385b0ec},
journal = {Microelectronics Reliability},
keywords = {dblp},
number = 12,
pages = {1417-1423},
timestamp = {2016-02-02T02:01:50.000+0100},
title = {Design optimization of gate-silicided ESD NMOSFETs in a 45 nm bulk CMOS technology.},
url = {http://dblp.uni-trier.de/db/journals/mr/mr49.html#AlvarezCRALGEHS09},
volume = 49,
year = 2009
}
