%0 Journal Article %1 journals/tim/TayHWC09 %A Tay, Arthur %A Ho, Weng Khuen %A Wu, Xiaodong %A Chen, Xiaoqi %D 2009 %J IEEE Trans. Instrumentation and Measurement %K dblp %N 12 %P 3978-3984 %T In Situ Monitoring of Photoresist Thickness Uniformity of a Rotating Wafer in Lithography. %U http://dblp.uni-trier.de/db/journals/tim/tim58.html#TayHWC09 %V 58

@article{journals/tim/TayHWC09, added-at = {2016-03-09T00:00:00.000+0100}, author = {Tay, Arthur and Ho, Weng Khuen and Wu, Xiaodong and Chen, Xiaoqi}, biburl = {https://puma.ub.uni-stuttgart.de/bibtex/2bc3ecba3cf0631b5569aa640cc33dbc2/dblp}, ee = {http://dx.doi.org/10.1109/TIM.2009.2021620}, interhash = {660f15808eaa0b9cded99274e6f41f6f}, intrahash = {bc3ecba3cf0631b5569aa640cc33dbc2}, journal = {IEEE Trans. Instrumentation and Measurement}, keywords = {dblp}, number = 12, pages = {3978-3984}, timestamp = {2016-03-10T11:40:15.000+0100}, title = {In Situ Monitoring of Photoresist Thickness Uniformity of a Rotating Wafer in Lithography.}, url = {http://dblp.uni-trier.de/db/journals/tim/tim58.html#TayHWC09}, volume = 58, year = 2009 }