%0 Journal Article %1 journals/tcad/YuanYP10 %A Yuan, Kun %A Yang, Jae-Seok %A Pan, David Z. %D 2010 %J IEEE Trans. on CAD of Integrated Circuits and Systems %K dblp %N 2 %P 185-196 %T Double Patterning Layout Decomposition for Simultaneous Conflict and Stitch Minimization. %U http://dblp.uni-trier.de/db/journals/tcad/tcad29.html#YuanYP10 %V 29

@article{journals/tcad/YuanYP10, added-at = {2010-02-17T00:00:00.000+0100}, author = {Yuan, Kun and Yang, Jae-Seok and Pan, David Z.}, biburl = {https://puma.ub.uni-stuttgart.de/bibtex/29c613ebafe2d730df589eef9b13b1ddb/dblp}, ee = {http://dx.doi.org/10.1109/TCAD.2009.2035577}, interhash = {5b77b480de827597f22dbcb156633b24}, intrahash = {9c613ebafe2d730df589eef9b13b1ddb}, journal = {IEEE Trans. on CAD of Integrated Circuits and Systems}, keywords = {dblp}, number = 2, pages = {185-196}, timestamp = {2016-02-02T10:07:43.000+0100}, title = {Double Patterning Layout Decomposition for Simultaneous Conflict and Stitch Minimization.}, url = {http://dblp.uni-trier.de/db/journals/tcad/tcad29.html#YuanYP10}, volume = 29, year = 2010 }