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%0 Journal Article
%1 journals/mr/AmatRNAS07
%A Amat, Esteve
%A Rodríguez, Rosana
%A Nafría, Montserrat
%A Aymerich, Xavier
%A Stathis, James H.
%D 2007
%J Microelectronics Reliability
%K dblp
%N 4-5
%P 544-547
%T Influence of the SiO2 layer thickness on the degradation of HfO2/SiO2 stacks subjected to static and dynamic stress conditions.
%U http://dblp.uni-trier.de/db/journals/mr/mr47.html#AmatRNAS07
%V 47
@article{journals/mr/AmatRNAS07,
added-at = {2018-12-03T00:00:00.000+0100},
author = {Amat, Esteve and Rodríguez, Rosana and Nafría, Montserrat and Aymerich, Xavier and Stathis, James H.},
biburl = {https://puma.ub.uni-stuttgart.de/bibtex/29a6741e245ce3828c8b56cdecfe90b3a/dblp},
ee = {https://doi.org/10.1016/j.microrel.2007.01.003},
interhash = {56dec24d09d994bf2c47e35234baba07},
intrahash = {9a6741e245ce3828c8b56cdecfe90b3a},
journal = {Microelectronics Reliability},
keywords = {dblp},
number = {4-5},
pages = {544-547},
timestamp = {2019-09-27T10:58:31.000+0200},
title = {Influence of the SiO2 layer thickness on the degradation of HfO2/SiO2 stacks subjected to static and dynamic stress conditions.},
url = {http://dblp.uni-trier.de/db/journals/mr/mr47.html#AmatRNAS07},
volume = 47,
year = 2007
}