%0 Journal Article %1 journals/mr/LembergerBB07 %A Lemberger, Martin %A Baunemann, A. %A Bauer, Anton J. %D 2007 %J Microelectronics Reliability %K dblp %N 4-5 %P 635-639 %T Chemical vapor deposition of tantalum nitride films for metal gate application using TBTDET and novel single-source MOCVD precursors. %U http://dblp.uni-trier.de/db/journals/mr/mr47.html#LembergerBB07 %V 47

@article{journals/mr/LembergerBB07, added-at = {2010-09-15T00:00:00.000+0200}, author = {Lemberger, Martin and Baunemann, A. and Bauer, Anton J.}, biburl = {https://puma.ub.uni-stuttgart.de/bibtex/267e973de638d32c92411b8f17d2f22f6/dblp}, ee = {http://dx.doi.org/10.1016/j.microrel.2007.01.032}, interhash = {38b83acb81dd33c2bcd8e37df9b3c414}, intrahash = {67e973de638d32c92411b8f17d2f22f6}, journal = {Microelectronics Reliability}, keywords = {dblp}, number = {4-5}, pages = {635-639}, timestamp = {2016-02-02T02:01:15.000+0100}, title = {Chemical vapor deposition of tantalum nitride films for metal gate application using TBTDET and novel single-source MOCVD precursors.}, url = {http://dblp.uni-trier.de/db/journals/mr/mr47.html#LembergerBB07}, volume = 47, year = 2007 }