<?xml version="1.0" encoding="UTF-8"?>
<rdf:RDF xmlns:community="http://www.bibsonomy.org/ontologies/2008/05/community#" xmlns:foaf="http://xmlns.com/foaf/0.1/" xmlns:owl="http://www.w3.org/2002/07/owl#" xmlns:admin="http://webns.net/mvcb/" xmlns:content="http://purl.org/rss/1.0/modules/content/" xmlns:syn="http://purl.org/rss/1.0/modules/syndication/" xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:taxo="http://purl.org/rss/1.0/modules/taxonomy/" xmlns:cc="http://web.resource.org/cc/" xmlns:xsd="http://www.w3.org/2001/XMLSchema#" xmlns:swrc="http://swrc.ontoware.org/ontology#" xmlns:rdfs="http://www.w3.org/2000/01/rdf-schema#" xmlns="http://purl.org/rss/1.0/" xmlns:rdf="http://www.w3.org/1999/02/22-rdf-syntax-ns#" xml:base="https://puma.ub.uni-stuttgart.de/tag/diffraction_grating%20diffraction%20model"><owl:Ontology rdf:about=""><rdfs:comment>PUMA publications for /tag/diffraction_grating%20diffraction%20model</rdfs:comment><owl:imports rdf:resource="http://swrc.ontoware.org/ontology/portal"/></owl:Ontology><rdf:Description rdf:about="https://puma.ub.uni-stuttgart.de/bibtex/2a8492260592f80e99852d85b3cde1c6f/ifsw"><owl:sameAs rdf:resource="/uri/bibtex/2a8492260592f80e99852d85b3cde1c6f/ifsw"/><rdf:type rdf:resource="http://swrc.ontoware.org/ontology#Article"/><owl:sameAs rdf:resource="https://opg.optica.org/oe/abstract.cfm?URI=oe-31-4-5334"/><swrc:date>Mon Feb 13 10:24:21 CET 2023</swrc:date><swrc:journal>Opt. Express</swrc:journal><swrc:month>feb</swrc:month><swrc:number>4</swrc:number><swrc:pages>5334--5346</swrc:pages><swrc:publisher><swrc:Organization swrc:name="Optica Publishing Group"/></swrc:publisher><swrc:title>General mathematical model for the period chirp in interference lithography</swrc:title><swrc:volume>31</swrc:volume><swrc:year>2023</swrc:year><swrc:keywords>myown chirp period Interference diffraction Laser-Interference-Lithography diffraction_grating shaping from:florianbienert mathematical Beam peer Laser beams gratings interference model Gaussian Holographic Scanning-Beam-Interference-Lithography </swrc:keywords><swrc:abstract>We present a general analytical model for the calculation of the spatial distribution of the grating period, enabling the unification of all configurations of classical laser interference lithography (LIL) and scanning-beam interference lithography (SBIL) into one formalism. This is possible due to the consideration of Gaussian beams instead of point sources which allow for the accurate description of not only the laser\&amp;\#x2019;s far-field but also its near-field. The proposed model enables the calculation of the grating period, the inclination and the slant of the grating lines on arbitrarily shaped substrates, originating from the interference of arbitrarily orientated and positioned Gaussian beams.</swrc:abstract><swrc:hasExtraField><swrc:Field swrc:value="10.1364/OE.481887" swrc:key="doi"/></swrc:hasExtraField><swrc:author><rdf:Seq><rdf:_1><swrc:Person swrc:name="Florian Bienert"/></rdf:_1><rdf:_2><swrc:Person swrc:name="Thomas Graf"/></rdf:_2><rdf:_3><swrc:Person swrc:name="Marwan Abdou Ahmed"/></rdf:_3></rdf:Seq></swrc:author></rdf:Description><foaf:Group rdf:about="https://puma.ub.uni-stuttgart.de/tag/diffraction_grating%20diffraction%20model"><foaf:name>diffraction_grating diffraction model</foaf:name><description>Community for tag(s) diffraction_grating diffraction model</description></foaf:Group></rdf:RDF>