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Device design issues for a high-performance technology with Si or SiGe epitaxial base

, , , , , , , and . Microelectronic Engineering, 15 (1-4): 11-14 (October 1991)
DOI: 10.1016/0167-9317(91)90172-A

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Device Design Issues for a High-Performance Bipolar Technology with Si Or SiGe Epitaxial Base, , , , , , , and . Proceedings of the 21st European Solid State Device Research Conference, - ESSDERC ’91, 16 - 19 September 1991, Montreux, Switzerland, page 11-14. Amsterdam, Elsevier, (1991)A High Performance 0.25/spl mu/m CMOS, , , , , , , , , and 17 other author(s). Digest of technical papers : 1993 Symposium on VLSI Technology : May 17 - 19, 1993, Kyoto, page 93-94. Piscataway, New Jersey, IEEE, (1993)A high performance epitaxial SiGe-base ECL BiCMOS technology, , , , , , , , , and 7 other author(s). Technical digest : International Electron Devices Meeting 1992 : San Francisco, CA, December 13 - 16, 1992, page 19-22. Piscataway, New Jersey, IEEE, (1992)Self-aligned SiGe-base heterojunction bipolar transistor by selective epitaxy emitter window (SEEW) technology, , , , , , , , and . IEEE Electron Device Letters, 11 (7): 288-290 (July 1990)75 GHz F-Sub-T SiGe-Base Heterojunction Bipolar Transistors, , , , , , , , , and . IEEE Electron Device Letters, 11 (4): 171-173 (April 1990)Novel Bipolar Transistor Isolation Structure Using Combined Selective Epitaxial Growth and Planarization Technique, , , , , , , , , and 2 other author(s). Proceedings of the 22nd European Solid State Device Research Conference Leuven, 14-17 September 1992, page 531-534. Amsterdam, Elsevier, (1992)SPIRIT : A Bipolar/BiCMOS Isolation Technology For High-Performance VLSI, , , , , , , , and . Digest of technical papers : 1993 Symposium on VLSI Technology : May 17 - 19, 1993, Kyoto, page 143-144. Piscataway, New Jersey, IEEE, (1993)SiGe Heterojunction Bipolar Transistors, , , , , , and . (1990)Novel In-Situ Doped Polysilicon Emitter Process With Buried Diffusion Source (BDS), , , , , , , and . IEEE Electron Device Letters, 12 (12): 679-681 (December 1991)Advanced Bipolar Technology for the 1990s, , , , , , , , , and 2 other author(s). 1991 International Symposium on VLSI Technology, Systems, and Applications : Proceedings of Technical Papers, page 269-273. Piscataway, New Jersey, IEEE, (1991)